ASM International N.V.
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Publicatie datum
27 nov 2007 - 18:00
Statutaire naam
ASM International N.V.
Titel
ASM International and Hitachi Kokusai Sign Licensing Agreement for Atomic Layer Deposition Technology
Bericht
BILTHOVEN, The Netherlands, November 27, 2007 - ASM International N.V. (Nasdaq: ASMI and Euronext Amsterdam: ASM) and Hitachi Kokusai Electric Inc. (Tokyo Stock Exchange (1st Section), and Osaka Securities Exchange (1st Section): Hitachi Kokusai Electric Inc.) announced today that they have signed a licensing agreement. According to this agreement ASM grants usage of its Atomic Layer Deposition (ALD) patents in the field of use of batch ALD to Hitachi Kokusai Electric Inc. Detailed terms of the agreement were not disclosed.
ASM has been a pioneer in ALD for many years and owns a substantial patent portfolio, including ALD patents and patents relating to batch ALD processing in a vertical furnace. With this technique it is possible to use ALD in a vertical furnace and process multiple wafers at the same time. This can give significant cost-of-ownership benefits for various ALD applications.
Dr. Albert Hasper, general manager of ASME commented: “ASM is renowned for its power of innovation, particularly in the area of ALD. Company policy for years has been to invest strongly in innovation and its protection. We are pleased that Hitachi Kokusai Electric Inc. recognized the value of this IP portfolio and that we have reached this agreement in a professional and business manner to the benefit of both companies. We believe it is in the best interest of the semiconductor industry to license this technology and allow another supplier to join us in serving the rapidly growing need for cost-effective ALD processing capabilities.”
Mr. Shoichiro Izumi, general manager of Hitachi Kokusai Electric Inc. commented: “We have been proceeding the development of Batch ALD over a period of time, and contributing to our customers' production of excellent semiconductor devices. We believe that this agreement will make progress in development of ALD technologies, and that we will contribute much further to our customers’ advantage.”
Datum laatste update: 01 september 2024